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Project Name
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Copper Based ALD Precursors
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Project Information
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1.* Technology Field
Major New Materials Engineering
Others
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2.* Technology brief:
GreenCentre has developed a series of Cu-containing precursor molecules suitable for use in Atomic Layer Deposition (ALD) as employed in the manufacture of micro-electronics. The ALD process requires specialized materials for the deposition process that exhibit high thermal stability and good volatility. GreenCentre’s precursor molecules do exhibit high thermal stability and good volatility and have been demonstrated as successful ALD precursors.
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3.* Description of the technical advantages:
GreenCentre’s precursor molecules exhibit properties that make them particularly well suited for use in ALD processes:
· excellent thermal stability;
· good volatility;
· reactive with H2 and plasma;
· do not contain oxygen or halogens, which can interfere with the deposition process;
· generate films via ALD with good film purity
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4.* The sustainability of the technical advantages: The carbon foot print associated with micro-electronic fabrication and use is second only to that associated with the transportation sector.The use of GreenCentre’s Cu-containing precursor compounds in ALD processes enables the continued miniaturization of micro-electronic devices, for example, semi-conductor interconnects. Consequently, the use of these precursors in ALD processes, significantly reduces energy consumption the use of these devices and waste generation typically associated with micro-electronic fabrication.
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5.* Risk of the technology:
The technology is in an early stage of development and a full performance analysis is required in order to more accurately quantify the scope of the market opportunity.
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6.* The current development situation and progress of the project:
The Cu-containing precursors have been manufactured in kilogram quantities and initial studies have been performed in the use of these precursors in thermal and plasma ALD. In moving ahead to the next stage of development, specific end users need to be identified and targeted for further development and adoption of the technology. Although a broad class of precursor molecules have been developed and protected via patent applications, additional studies are required to expand the scope of ALD precursor molecules that have been fully characterized and tested.
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7.* Prospective market value/business value:
Application of this technology will enable the next step in semiconductor miniaturization, as predicted by Moors Law.
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8.* Intellectual Property
Technology Know-how; Patent
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9. Description of the technical requirements
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10. Ideal way of cooperation
Technology License; Cooperative R&D
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For more project information, please contact: services@beijing-ontario.org